Publications in OpenAlex of which a co-author is affiliated to this organization
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| Title | DOI |
|---|---|
| https://doi.org/10.1016/j.seppur.2017.12.009 | Electrochemical oxidation of key pharmaceuticals using a boron doped diamond electrode |
| https://doi.org/10.1109/iedm.2010.5703278 | Comprehensive analysis of the impact of single and arrays of through silicon vias induced stress on high-k / metal gate CMOS performance |
| https://doi.org/10.1002/stem.2600 | Multipotent Adult Progenitor Cells Enhance Recovery After Stroke by Modulating the Immune Response from the Spleen |
| https://doi.org/10.1016/j.jenvman.2021.112926 | Recent advances in technologies for removal and recovery of selenium from (waste)water: A systematic review |
| https://doi.org/10.1016/j.jinf.2020.09.021 | Seroprevalence of SARS-CoV-2 significantly varies with age: Preliminary results from a mass population screening |
| https://doi.org/10.1016/j.jece.2023.109993 | Removal of miconazole from water by O3, UV/H2O2 and electrochemical advanced oxidation: Real-time process monitoring and degradation pathway elucidation |
| https://doi.org/10.1016/j.envpol.2023.122220 | Treatment of antimicrobial azole compounds via photolysis, electrochemical and photoelectrochemical oxidation: Degradation kinetics and transformation products |
| https://doi.org/10.1039/d5cs00306g | Computational insights on the role of structure-directing agents (SDAs) in the synthesis of zeolites |
| https://doi.org/10.1117/12.898864 | Repair of natural EUV reticle defects |
| https://doi.org/10.1007/978-1-4419-9660-2 | DSP Architecture Design Essentials |
| https://doi.org/10.1117/12.917804 | Calibration and verification of a stochastic model for EUV resist |
| https://doi.org/10.1016/j.chemosphere.2022.136127 | Recent advances in carbonaceous catalyst design for the in situ production of |
| https://doi.org/10.1016/j.chemosphere.2023.137984 | Anodic oxidation of sulfamethoxazole paired to cathodic hydrogen peroxide production |
| https://doi.org/10.1016/j.jenvman.2024.120023 | Comprehensive two-dimensional liquid chromatography with high resolution mass spectrometry to investigate the photoelectrochemical degradation of environmentally relevant pharmaceuticals and their degradation products in water |
| https://doi.org/10.1109/iedm45741.2023.10413675 | Generative AI on a Budget: Processing Transformer- based Neural Networks at the Edge |
| https://doi.org/10.1109/cicc.2012.6330695 | A 2.3mW 10-bit 170MS/s two-step binary-search assisted time-interleaved SAR ADC |
| https://doi.org/10.3390/w10030247 | Degradation of 4-Chlorophenol by Microwave-Enhanced Advanced Oxidation Processes: Kinetics and Influential Process Parameters |
| https://doi.org/10.1016/j.jwpe.2023.104133 | Improving the removal of losartan, irbesartan and their transformation products through in situ produced hydrogen peroxide in electrochemical oxidation processes |
| https://doi.org/10.1117/12.2046522 | Experimental validation of rigorous, 3D profile models for negative-tone develop resists |
| https://doi.org/10.1109/indin.2011.6035001 | Parallel paradigms and run-time management techniques for many-core architectures: The 2PARMA approach |
| https://doi.org/10.1117/12.2297677 | Double patterning at NA 0.33 versus high-NA single exposure in EUV lithography: an imaging comparison |
| https://doi.org/10.1117/12.2259964 | Modeling EUVL patterning variability for metal layers in 5nm technology node and its effect on electrical resistance |
| https://doi.org/10.3390/w12061653 | Predicting Residual Adsorbable Organic Halides Concentrations in Industrial Wastewater Using Typical Wastewater Parameters |
| https://doi.org/10.1117/12.2046487 | A fast triple patterning solution with fix guidance |
| https://doi.org/10.1117/12.848290 | EUV modeling accuracy and integration requirements for the 16nm node |
| https://doi.org/10.1117/1.jmm.15.1.013505 | Rigorous assessment of patterning solution of metal layer in 7 nm technology node |
| https://doi.org/10.1007/978-1-4419-6778-7_4 | ASIP Exploration and Design |
| https://doi.org/10.1117/1.jmm.13.2.023005 | Study of CD variation caused by the black border effect and out-of-band radiation in extreme ultraviolet lithography |
| https://doi.org/10.1109/isvlsi.2010.71 | Mapping Optimisation for Scalable Multi-core ARchiTecture: The MOSART Approach |
| https://doi.org/10.1117/12.2085328 | Patterning process exploration of metal 1 layer in 7nm node with 3D patterning flow simulations |
| https://doi.org/10.1109/apccas.2012.6419023 | A 10-bit SAR ADC with two redundant decisions and splitted-MSB-cap DAC array |
| https://doi.org/10.1117/12.916466 | Binary modeling method to check the sub-resolution assist features (SRAFs) printability |
| https://doi.org/10.1117/12.2027880 | Simulation study of CD variation caused by field edge effects and out-of-band radiation in EUVL |
| https://doi.org/10.23919/eucap57121.2023.10133088 | Disruptive C-band Corrugated Horn Antenna in Additive Manufacturing |
| https://doi.org/10.1117/12.2296865 | Impact of EUV mask absorber sidewall angle on patterning robustness |
| https://doi.org/10.1109/vts56346.2023.10140059 | Innovation Practices Track: VLSI Functional Safety |
| https://doi.org/10.1109/vts56346.2023.10140064 | Innovation Practices Track: Silicon Lifecycle Management Challenges and Opportunities |
| https://doi.org/10.4018/jertcs.2011070101 | Optimized Communication Architecture of MPSoCs with a Hardware Scheduler |
| https://doi.org/10.1117/12.693080 | Combined resist and etch modeling and correction for the 45-nm node |
| https://doi.org/10.1007/978-94-007-1488-5_5 | 2PARMA: Parallel Paradigms and Run-time Management Techniques for Many-Core Architectures |
| https://doi.org/10.1117/12.681822 | Resist and etch modeling for the 45nm node |
| https://doi.org/10.4018/jertcs.2013010104 | Efficient Implementation of Application-Aware Spinlock Control in MPSoCs |
| https://doi.org/10.1117/12.2085506 | Experimental validation of stochastic modeling for negative-tone develop EUV resists |
| https://doi.org/10.4018/978-1-4666-2776-5.ch009 | Optimized Communication Architecture of MPSoCs with a Hardware Scheduler |
| https://doi.org/10.1007/978-94-007-1488-5_11 | The MOSART Mapping Optimization for Multi-Core ARchiTectures |
| https://doi.org/10.1109/recosoc.2011.5981522 | Invited paper: Parallel programming and run-time resource management framework for many-core platforms: The 2PARMA approach |
| https://doi.org/10.1145/2107763.2107774 | Parallel paradigms and run-time management techniques for many-core architectures |
| https://doi.org/10.1007/978-3-030-31121-6_8 | Designing Primary Care Ecosystems in Belgium: Early Reflections |
| https://doi.org/10.1109/vts56346.2023.10140106 | Innovation Practices Track: Innovation on Telemetry Monitoring |
| https://doi.org/10.1117/12.2296864 | Extreme ultraviolet mask multilayer material variation impact on horizontal to vertical pattern bias |
| https://doi.org/10.1117/12.2515511 | Impact of EUV absorber variations on wafer patterning |
| https://doi.org/10.1117/12.2552236 | Prediction of EUV stochastic microbridge probabilities by lithography simulations |
| https://doi.org/10.1117/12.801525 | Automated OPC model collection, cleaning, and calibration flow |
| https://doi.org/10.1117/12.793030 | OPC model enhancement using parameter sensitivity methodology |
| https://doi.org/10.1109/apccas.2012.6418964 | A DT 0–2 MASH ΣΔ modulator with VCO-based quantizer for enhanced linearity |
| https://doi.org/10.1117/12.793044 | Rigorous vectorial modeling for polarized illumination and projection pupil in OPC |
| https://doi.org/10.1109/issoc.2012.6376352 | Application-aware spinlock control using a hardware scheduler in MPSoC platforms |
| https://doi.org/10.1109/issoc.2010.5625556 | Optimized communication architecture of MPSoCs with a hardware scheduler: A system view |
| https://doi.org/10.1002/chin.199118195 | ChemInform Abstract: A General Synthesis of 3,5‐Dihalo‐2H‐1,4‐oxazin‐2‐ones from Cyanohydrins. |
| https://doi.org/10.4018/978-1-4666-6034-2.ch014 | System-Level Analysis of MPSoCs with a Hardware Scheduler |
| https://doi.org/10.5555/2485288.3250216 | Session details: Scheduling for real-time embedded systems |
| https://doi.org/10.5555/2485288.3250180 | Session details: Hot topic: IP subsystems: the next productivity wave? |
| https://doi.org/10.4018/978-1-4666-9624-2.ch035 | System-Level Analysis of MPSoCs with a Hardware Scheduler |
| https://doi.org/10.1007/978-981-15-6401-7_67-1 | Retargetable Compilation |
| https://doi.org/10.1109/vts60656.2024.10538929 | Innovation Practices Track: Advances on Silicon Lifecycle Reliability, Safety and Security |
| https://doi.org/10.1007/978-981-97-9314-3_67 | Retargetable Compilation |
| https://doi.org/10.23919/vlsitechnologyandcir65189.2025.11075021 | Extending the Gate-All-Around (GAA) Era to the A10 Node: Outer Wall Forksheet Enabling Full Channel Strain and Superior Gate Control |
| https://doi.org/10.1109/sensors59705.2025.11330672 | Non-Intrusive Plant Dynamic Monitoring Using mmWave Radar |
| https://doi.org/10.1109/sensors59705.2025.11330430 | RF-Powered Batteryless Plant Movement Sensor for Precision Agriculture |
| https://doi.org/10.5281/zenodo.18632569 | Extending the Gate-All-Around (GAA) era to the A10 node: Outer Wall Forksheet enabling full channel strain and superior gate control |
| https://doi.org/10.5281/zenodo.18632568 | Extending the Gate-All-Around (GAA) era to the A10 node: Outer Wall Forksheet enabling full channel strain and superior gate control |