Philips (Belgium)

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Title DOI
https://doi.org/10.1109/iitc.2002.1014959 Atomic layer deposition of barriers for interconnect
https://doi.org/10.1117/12.2224042 LED light engine concept with ultra-high scalable luminance
https://doi.org/10.1007/978-3-642-69389-2_5 Bootstrap methods, sampling distributions
https://doi.org/10.1186/s41687-025-00980-4 Patient-reported outcome and experience measures in cardiovascular disease: a scoping review as part of iCARE4CVD
https://doi.org/10.1007/978-3-642-83069-3 Pattern Recognition Theory and Applications
https://doi.org/10.1016/0743-7315(86)90008-0 Strategies for interconnection networks: Some methods from graph theory
Recursive neural networks for associative memory
https://doi.org/10.1080/15326348908807110 The n/g/l finite capacity queue
https://doi.org/10.1016/0166-218x(88)90034-0 Minimal test patterns for connectivity preservation in parallel thinning algorithms for binary digital images
https://doi.org/10.1007/3-540-46885-4_43 How easy is collision search? Application to DES
https://doi.org/10.1016/s0167-6911(84)80033-x Reduced order observers: A new algorithm and proof
https://doi.org/10.1007/3-540-47721-7_9 Public-key Systems Based on the Difficulty of Tampering (Is there a difference between DES and RSA?)
https://doi.org/10.1109/led.2005.861404 Work function of Ni silicide phases on HfSiON and SiO/sub 2/: NiSi, Ni/sub 2/Si, Ni/sub 31/Si/sub 12/, and Ni/sub 3/Si fully silicided gates
https://doi.org/10.1016/j.mseb.2004.07.028 Ni based silicides for 45nm CMOS and beyond
https://doi.org/10.1109/iedm.2005.1609503 Device and circuit-level analog performance trade-offs: a comparative study of planar bulk FETs versus FinFETs
https://doi.org/10.1109/tit.1982.1056525 Algebraic constructions of Shannon codes for regular channels
https://doi.org/10.1016/0024-3795(86)90173-4 On the quadratic convergence of Kogbetliantz's algorithm for computing the singular value decomposition
https://doi.org/10.1109/led.2004.824242 Revised Method for Extraction of the Thermal Resistance Applied to Bulk and SOI SiGe HBTs
https://doi.org/10.1148/radiol.2471070685 Pancreatic Perfusion: Noninvasive Quantitative Assessment with Dynamic Contrast-enhanced MR Imaging without and with Secretin Stimulation in Healthy Volunteers—Initial Results
https://doi.org/10.1007/bf00264015 Formal derivation of strongly correct concurrent programs
https://doi.org/10.1109/jsen.2003.816261 A hygrometer comprising a porous silicon humidity sensor with phase-detection electronics
https://doi.org/10.1159/000102978 Prevalence and Determinants of Coronary and Aortic Calcifications Assessed by Chest CT in Renal Transplant Recipients
https://doi.org/10.1109/.2005.1469257 Experimental and comparative investigation of low and high field transport in substrate- and process-induced strained nanoscaled MOSFETs
https://doi.org/10.1109/iedm.2005.1609354 Dielectric resurf: breakdown voltage control by STI layout in standard CMOS
https://doi.org/10.1007/978-94-009-0501-6_5 On the Role of Orthogonal Polynomials on the Unit Circle in Digital Signal Processing Applications
https://doi.org/10.1016/j.mseb.2003.10.052 MBE lanthanum-based high-k gate dielectrics as candidates for SiO2 gate oxide replacement
https://doi.org/10.1016/s0195-6698(85)80039-1 On the Nonbinary Johnson Scheme
https://doi.org/10.1063/1.1869540 Low-temperature diffusion of high-concentration phosphorus in silicon, a preferential movement toward the surface
https://doi.org/10.1063/1.2163985 Characterization of field-effect transistors with La2Hf2O7 and HfO2 gate dielectric layers deposited by molecular-beam epitaxy
https://doi.org/10.1016/s0167-9317(03)00366-6 Thickness scaling issues of Ni silicide
https://doi.org/10.1109/tassp.1983.1164154 Optimal design of minimum-phase FIR filters
https://doi.org/10.1016/j.sse.2004.08.021 Tunneling 1/fγ noise in 5nm HfO2/2.1nm SiO2 gate stack n-MOSFETs
https://doi.org/10.1021/jp800675w Screening and Separation of Charges in Microscale Devices: Complete Planar Solution of the Poisson−Boltzmann Equation
https://doi.org/10.1117/12.354385 Novel aberration monitor for optical lithography
https://doi.org/10.1002/jmri.25089 Liver apparent diffusion coefficient repeatability with individually predetermined optimal cardiac timing and artifact elimination by signal filtering
https://doi.org/10.1016/0167-8655(86)90066-8 On the editing rate of the Multiedit algorithm
https://doi.org/10.1016/j.sse.2009.09.007 Quantitative prediction of junction leakage in bulk-technology CMOS devices
https://doi.org/10.1016/j.mee.2004.07.048 Low temperature spike anneal for Ni-silicide formation
https://doi.org/10.1109/ted.2006.873848 A new analytical model for the thermal resistance of deep-trench bipolar transistors
https://doi.org/10.1109/iedm.2004.1419129 A 0.314μm/sup 2/ 6T-SRAM cell build with tall triple-gate devices for 45nm node applications using 0.75NA 193nm lithography
https://doi.org/10.1159/000127439 Cigarette Smoke Exposure Promotes Arterial Thrombosis and Vessel Remodeling after Vascular Injury in Apolipoprotein E-Deficient Mice
https://doi.org/10.1007/s00256-017-2580-2 Low-dose CT imaging of a total hip arthroplasty phantom using model-based iterative reconstruction and orthopedic metal artifact reduction
https://doi.org/10.1109/iedm.2005.1609500 Demonstration of recessed SiGe S/D and inserted metal gate on HfO/sub 2/ for high performance pFETs.
https://doi.org/10.1117/1.oe.54.5.055101 Incoupling and outcoupling of light from a luminescent rod using a compound parabolic concentrator
https://doi.org/10.1016/j.mee.2004.07.019 Impact of different slurry and polishing pad choices on the planarization efficiency of a copper CMP process
https://doi.org/10.1109/mwsym.2005.1516931 Active-inductor-based low-power broadband harmonic VCO in SiGe technology for wideband and multi-standard applications
https://doi.org/10.3390/electronics10060748 Keyframe Insertion: Enabling Low-Latency Random Access and Packet Loss Repair
https://doi.org/10.1088/1742-6596/2042/1/012033 An assessment of operational economic benefits of renewable energy communities in Belgium
https://doi.org/10.1109/ted.2005.864382 Effect of the gap size on the SSI efficiency of split-gate memory cells
https://doi.org/10.1007/s00330-017-5021-7 Could new reconstruction CT techniques challenge MRI for the detection of brain metastases in the context of initial lung cancer staging?
https://doi.org/10.1109/.2005.1469230 Integration of tall triple-gate devices with inserted-Ta/sub x/N/sub y/ gate in a 0.274μm/sup 2/ 6t-sram cell and advanced CMOS logic circuits
https://doi.org/10.3390/rs15204950 Study on the Potential of Oil Spill Monitoring in a Port Environment Using Optical Reflectance
https://doi.org/10.1145/3130859.3131308 The Design of a Virtual Reality Game for Stroke-Induced Attention Deficits
https://doi.org/10.1080/17843286.2022.2068296 Changes in the use and uptake of a national out-of-hours telephone triage service by younger and older patients seeking non-urgent unplanned care surrounding the COVID-19 pandemic in Flanders (Belgium)
https://doi.org/10.1063/1.4801850 Note: Measuring breakdown characteristics during the hot re-ignition of high intensity discharge lamps using high frequency alternating current voltage
https://doi.org/10.1016/0167-6911(86)90026-5 A reduced order observer for descriptor systems
https://doi.org/10.1016/0304-3975(86)90164-7 A topological characterization of thinning
https://doi.org/10.1007/bfb0031053 Spectral properties of finite Toeplitz matrices
https://doi.org/10.1007/978-1-4612-5648-9_13 Cubature Formulae, Polytopes, and Spherical Designs
https://doi.org/10.1007/bf01398880 On efficient implementations of Kogbetliantz's algorithm for computing the singular value decomposition
https://doi.org/10.1109/iedm.2001.979469 CMOS device optimization for mixed-signal technologies
https://doi.org/10.1109/34.16713 A bibliography on digital and computational convexity (1961-1988)
https://doi.org/10.1109/proc.1986.13644 A knowledge representation language for requirements engineering
https://doi.org/10.1109/.2005.1469231 Tall triple-gate devices with TiN/HfO/sub 2/ gate stack
https://doi.org/10.1109/ted.2005.845078 Cryogenic Operation of Third-Generation, 200-GHz Peak-<tex>$f_T$</tex>, Silicon–Germanium Heterojunction Bipolar Transistors
https://doi.org/10.1016/s0167-9317(02)00795-5 Development of sub-10-nm atomic layer deposition barriers for Cu/low-k interconnects
https://doi.org/10.1109/tit.1981.1056290 Bounds and constructions for binary asymmetric error-correcting codes (Corresp.)
https://doi.org/10.1016/j.mssp.2004.09.011 Application of Ru-based gate materials for CMOS technology
https://doi.org/10.1063/1.1904159 Atomistic analysis of the evolution of boron activation during annealing in crystalline and preamorphized silicon
https://doi.org/10.1063/1.1882756 Enhanced boron activation in silicon by high ramp-up rate solid phase epitaxial regrowth
https://doi.org/10.1016/0955-2219(94)90117-1 On the mechanism of delamination fracture of BaTiO3-based PTC thermistors
https://doi.org/10.1109/iedm.2003.1269287 Performance comparison of sub 1 nm sputtered TiN/HfO/sub 2/ nMOS and pMOSFETs
https://doi.org/10.1149/1.1447946 Examination of the Si(111)-SiO[sub 2], Si(110)-SiO[sub 2], and Si(100)-SiO[sub 2] Interfacial Properties Following Rapid Thermal Annealing
https://doi.org/10.1116/1.1638774 Leakage optimization of ultra-shallow junctions formed by solid phase epitaxial regrowth
https://doi.org/10.1007/3-540-46885-4_13 2n-Bit Hash-Functions Using n-Bit Symmetric Block Cipher Algorithms
https://doi.org/10.1109/bipol.2005.1555196 Unilfied electro-thermal stability criterion for bipolar transistors
https://doi.org/10.1016/j.mee.2005.07.014 Advanced Cu interconnects using air gaps
https://doi.org/10.1117/12.962267 Updating Singular Value Decompositions. A Parallel Implementation.
https://doi.org/10.1016/j.apsusc.2003.08.030 A new technique to fabricate ultra-shallow-junctions, combining in situ vapour HCl etching and in situ doped epitaxial SiGe re-growth
https://doi.org/10.1109/iedm.2002.1175795 Compact modeling of drain and gate current noise for RF CMOS
https://doi.org/10.1063/1.1866640 Band alignment at the interface of (100)Si with HfxTa1−xOy high-κ dielectric layers
https://doi.org/10.1016/s0195-6698(85)80004-4 On a Pair of Dual Subschemes of the Hamming Scheme Hn(q)
https://doi.org/10.1109/ted.2004.838449 Scaling of Characteristic Frequencies in RF CMOS
https://doi.org/10.1007/978-3-642-83069-3_13 Learning the Parameters of a Hidden Markov Random Field Image Model: A Simple Example
https://doi.org/10.1109/iedm.2006.346954 Doubling or quadrupling MuGFET fin integration scheme with higher pattern fidelity, lower CD variation and higher layout efficiency
https://doi.org/10.1109/led.2004.838557 Impact Ionization in Thin Silicon Diodes
https://doi.org/10.1109/69.88002 Controlled generation of intensional answers
https://doi.org/10.1016/s0167-9317(03)00381-2 Material modification of the patterned wafer during dry etching and strip determined by XPS
https://doi.org/10.1080/00994480.1997.10748174 Metal Halide Lamps with Ceramic Envelopes: A Breakthrough in Color Control
https://doi.org/10.1116/1.1643053 Chemical and electrical dopants profile evolution during solid phase epitaxial regrowth
https://doi.org/10.1109/tcs.1985.1085753 Minimal realizations of pseudo-positive and pseudo-bounded rational matrices
https://doi.org/10.1109/bipol.2006.311150 Physical Description of the Mixed-Mode Degradation Mechanism for High Performance Bipolar Transistors
https://doi.org/10.1109/ispsd.2002.1016215 Manufacturing of high aspect-ratio p-n junctions using vapor phase doping for application in multi-Resurf devices
https://doi.org/10.1109/led.2005.855413 In-depth characterization of the hole mobility in 50-nm process-induced strained MOSFETs
https://doi.org/10.1109/icmts.2006.1614265 Specific contact resistance measurements of metal-semiconductor junctions
https://doi.org/10.1023/a:1006618806152 Aging of NTC ceramics investigated by magnetic measurements
https://doi.org/10.1016/j.ijrmhm.2005.10.010 Numerical simulation of the drawing process of tungsten wires
https://doi.org/10.1109/led.2006.877711 Accurate channel length extraction by split C-V measurements on short-channel MOSFETs
https://doi.org/10.1016/0167-8655(85)90035-2 A multiclass, k-NN approach to Bayes risk estimation
https://doi.org/10.1016/j.mee.2005.04.050 Band alignment between (100)Si and Hf-based complex metal oxides