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Title DOI
https://doi.org/10.1116/6.0002793 Challenges in porosity characterization of thin films: Cross-evaluation of different techniques
https://doi.org/10.3390/polym16152230 Comprehensive Review on the Impact of Chemical Composition, Plasma Treatment, and Vacuum Ultraviolet (VUV) Irradiation on the Electrical Properties of Organosilicate Films
https://doi.org/10.3390/nano12091600 In-Situ Imaging of a Light-Induced Modification Process in Organo-Silica Films via Time-Domain Brillouin Scattering
https://doi.org/10.3390/coatings14111412 Exploring the Relationship Between Electrical Characteristics and Changes in Chemical Composition and Structure of OSG Low-K Films Under Thermal Annealing
https://doi.org/10.1016/j.matchemphys.2022.126571 Benzene bridged hybrid organosilicate films with improved stiffness and small pore size
https://doi.org/10.1021/acsaelm.2c00281 Modification of Porous Ultralow-k Film by Vacuum Ultraviolet Emission
https://doi.org/10.3390/nano13081419 UV-Excited Luminescence in Porous Organosilica Films with Various Organic Components
https://doi.org/10.1016/j.micromeso.2023.112783 Temperature evolution of organosilicate glass films with organic bridges
https://doi.org/10.1002/ppap.202200169 Damage to OSG low‐k films during IPVD deposition of the Ta barrier layer
https://doi.org/10.3390/coatings13091656 Structural and Luminescence Properties of Eu-Doped PMO Films with Ethylene Bridge and Methyl Terminal Groups
https://doi.org/10.20944/preprints202303.0348.v1 Understanding the Origin of Luminescence in Porous Organosilica Films with Various Organic Components
https://doi.org/10.20944/preprints202407.0106.v1 Comprehensive Review on the Impact of Chemical Composition, Plasma Treatment, and Vacuum Ultraviolet (VUV) Irradiation on the Electrical Properties of Organosilicate Films
https://doi.org/10.20944/preprints202307.2068.v1 Structural and Luminescence Properties of Eu-Doped PMO Films with Ethylene Bridge and Methyl Terminal Groups
https://doi.org/10.1002/ppap.202300206 Challenges in scaling of IPVD deposited Ta barriers on OSG low‐k films: Carbonization of Ta by CHx radicals generated through VUV‐induced decomposition of carbon‐containing groups